Nanoparticle sources

Our group is intensively focused on the preparation of nanoparticles using so-called Gas Aggregation cluster Sources (GAS) based on magnetron sputtering and Plasma Enhanced Chemical Vapour Deposition (PE-CVD). This method of nanoparticle synthesis offers several fundamental advantages compared to other procedures (e.g., compared to chemical synthesis), such as the purity of the produced nanoparticles, the possibility of depositing nanoparticles onto any substrate compatible with high-vacuum conditions, the directionality of deposition, and the ability to combine nanoparticle sources with other vacuum deposition techniques, which allows for the preparation of complex nanocomposite and nanostructured materials.

Over the last approximately 10 years, we have developed and constructed a whole range of different types of gas aggregation sources that are suitable for the preparation of nanoparticles of metals or their oxides, nitrides, and carbides. At the moment, we are designing novel concepts of gas aggregation sources, either based on cylindrical post magnetrons, magnetrons with rotating magnetic circuits or systems with auxiliary RF plasma generated in the aggregation zone. Furthermore, our group is among the pioneers in the preparation of plasma polymer nanoparticles.

Recently, we have also developed several systems that allow for the preparation of heterogeneous multi-component nanoparticles. These systems are based on the use of:

In this area, our group is one of the best-equipped workplaces globally!!!!