Atmospheric pressure plasma sources

Our department has two different types of atmospheric plasma sources available, which we primarily use for the modification, activation, and etching of polymer material surfaces, or for the treatment of biological systems (e.g., bacteria, seeds) and liquids.

The first of these is a Radio Frequency (RF) plasma jet. This can be installed on a programmable mechanism, allowing for 3D movement of the jet over the treated surface. Argon is primarily used as the working gas to generate plasma in the plasma jet.

The second type is an apparatus based on a Dielectric Barrier Discharge (DBD). This system allows plasma to be generated in any gas, including laboratory air. By using a suitable organic precursor, both types of atmospheric plasma sources can also be used for thin film deposition.